W. Scott Rader is the President of Fujimi Corporation, leveraging a Ph. D. in Inorganic Chemistry and a Stanford Executive Program certificate in his leadership. With the company since 1998, he has progressed through numerous R&D and executive roles, demonstrating deep technical and strategic expertise.
He is a published academic, having co-authored scientific papers on highly technical subjects like the behavior of colloidal silica particles in CMP slurry.
W. Scott Rader
President at Fujimi Corporation
Tualatin, Oregon, United States
Overview
Topics They Care About
CMP Slurry Technology
He has co-authored technical papers on Chemical Mechanical Planarization (CMP) slurries, indicating deep subject matter expertise in his company's core technology.
Semiconductor Manufacturing
His career at Fujimi has focused on developing and leading teams that supply critical polishing slurries to the semiconductor industry.
Strategic R&D
His background includes multiple roles as Director and VP of Research and Development, showing a long-term focus on innovation and new business development.
Media Appearances
W. has no verified media appearances
Work History
4-2026
President at Fujimi Corporation
4-2023 - 3-2026
Executive Vice President at Fujimi Corporation
4-2022
Board Member at Fujimi Corporation
4-2018 - 4-2023
Vice President at Fujimi Corporation
1-2013 - 3-2022
Director, Research and Development at Fujimi Corporation
1-2011 - 3-2026
Director, New Business Development at Fujimi Corporation
6-2000 - 12-2010
Manager, Research and Development at Fujimi Corporation
5-1998 - 5-2000
Product Development Chemist at Fujimi Corporation
6-1995 - 4-1998
Applications Manager at OI Analytical
Education
Stanford Executive Program from Stanford University Graduate School of Business
1990 - 1995
Doctor of Philosophy (Ph.D.) from University of Nevada, Reno
More Information
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Location : Tualatin, Oregon, United States
Job Level : N/A
Designation : President at Fujimi Corporation
