Li-Jin Chen is the Director of Engineering at Siemens EDA, specializing in computational lithography and metrology. A PhD graduate from MIT, he is a published researcher with deep expertise in applying machine learning and advanced regression to enhance Optical Proximity Correction (OPC) modeling, previously leading R&D teams at Synopsys and TSMC.
He was awarded the prestigious Taiwan Merit Scholarship for overseas graduate studies and is an Honorary Member of the Phi Tau Phi society, recognizing him as a top 3% graduate.
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