Marc Hennemeyer in

Marc Hennemeyer

Critic · DISC type C
Director Lithography Application Center at SUSS MicroTec
📍 Garching, Bavaria, Germany

Professional overview including current role context, leadership scope, domain focus, and career trajectory to help you understand background relevance before outreach.

Key behavioral and communication insights including interaction style, decision-making tendencies, and motivation drivers to tailor messaging and personalize conversations.

Business priorities, areas of interest, and practical outreach recommendations that can improve conversion quality for this professional.

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Experience
21 Years
Current Role
Director Lithography Application Center
Job Level
Mid-senior
Location
Garching, Bavaria, Germany
Personality Overview

How Marc shows up

Negotiator
Precise
Critic

Unless the value is proven by data, they are unlikely to value fancy features. It is very likely that they will negotiate pricing or other important terms. They like to do things independently and don’t look for support from others.

Priorities

Topics Marc cares about

Strategic Priorities
Topic insights and context to help personalize outreach and discovery conversations.
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Career

Work history

5-2018
Director Lithography Application Center
SUSS MicroTec
3-2012 - 5-2018
Product Manager
SUSS MicroTec
10-2010 - 3-2012
Project Manager Applications
SUSS MicroTec
7-2004 - 5-2008
PhD Student
Ludwig-Maximilians-Universität (LMU) München
1-2002 - 6-2004
Research Assistant
Ludwig-Maximilians-Universität (LMU) München
In the press

Media appearances

Media appearances and press coverage highlighting public visibility and thought leadership.
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Education
2004 - 2008
Dr. rer. nat.
Ludwig-Maximilians-Universität München
1994 - 2001
Diplom-Physiker
Ludwig-Maximilians-Universität München
Social presence
in
Behavioral profile

DISC profile (public)

C

Calculativeness (C)

Calculativeness (C) reflects the degree to which a person is likely to be cautious, systematic and analytical. Those scoring high tend to emphasise quality and accuracy.

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