Ralf Huck in

Ralf Huck

Critic · DISC type C
CTO Measurement Intelligence (Instrumentation and Analytics) at Siemens
📍 Germany

Professional overview including current role context, leadership scope, domain focus, and career trajectory to help you understand background relevance before outreach.

Key behavioral and communication insights including interaction style, decision-making tendencies, and motivation drivers to tailor messaging and personalize conversations.

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Experience
22 Years
Current Role
CTO Measurement Intelligence (Instrumentation and Analytics)
Job Level
Leadership
Location
Germany
Personality Overview

How Ralf shows up

Objective Thinker
Critic
Precise

They don’t appreciate bells and whistles unless backed by data. They enjoy working alone and do not rely on others very often. They are quite likely to negotiate on pricing or other key terms.

Priorities

Topics Ralf cares about

Strategic Priorities
Topic insights and context to help personalize outreach and discovery conversations.
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Career

Work history

4-2021
CTO Measurement Intelligence (Instrumentation and Analytics)
Siemens
10-2015 - 3-2021
Vice President, Head of PRM Process Instruments
Siemens
10-2011 - 9-2015
Vice President Subsegment Pressure, Temperature and Positioner
Siemens
1-2003 - 11-2010
Head of R&D
ABB
In the press

Media appearances

Media appearances and press coverage highlighting public visibility and thought leadership.
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Education
1986 - 1989
Dr.
RWTH Aachen University
1981 - 1985
Dipl. Phys
RWTH Aachen University
Social presence
in
Behavioral profile

DISC profile (public)

C

Calculativeness (C)

Calculativeness (C) reflects the degree to which a person is likely to be cautious, systematic and analytical. Those scoring high tend to emphasise quality and accuracy.

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